Request InfoHORIBAHoriba Scientific has announced a differential interferometry profiling (DIP) system for depth profiling in glow discharge optical emission spectrometry (GD-OES). GD-OES is a technique for fast, multi-elemental depth profiling of conductive and nonconductive materials. GD-OES relies on plasma for the sputtering of a representative area of the investigated specimen and on a high resolution spectrometer for the simultaneous measurement of all elements of interest. DIP provides real-time layer thickness, crater depth and sputter rate without calibration. 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