Close

Search

Search Menu
Photonics Media Photonics Marketplace Photonics Spectra BioPhotonics EuroPhotonics Vision Spectra Photonics Showcase Photonics ProdSpec Photonics Handbook

Light Sources

Facebook Twitter LinkedIn Email Comments
Request Info
Gigaphoton Inc.
OYAMA, Japan, April 6, 2020 — Gigaphoton Inc. has announced two new light sources for use in semiconductor lithography. The GT66A ArF immersion laser is equipped with a newly developed optical module to reduce spatial coherence and improve beam uniformity on the exposed surface. The G60K KrF light source has undergone a full model change, increasing power output by a factor of 1.5× compared to the existing model by introducing a new power supply unit.See full product

Related content from Photonics Media



    PRODUCTS


    ARTICLES


    PHOTONICS HANDBOOK ARTICLES


    WHITEPAPERS


    WEBINARS


    PHOTONICS DICTIONARY+ TERMS


    VIDEOS


    PHOTONICS BUYERS' GUIDE CATEGORIES


    COMPANIES


    LATEST HEADLINES
    view all
    back to top
    Facebook Twitter Instagram LinkedIn YouTube RSS
    ©2021 Photonics Media, 100 West St., Pittsfield, MA, 01201 USA, [email protected]

    Photonics Media, Laurin Publishing
    x We deliver – right to your inbox. Subscribe FREE to our newsletters.
    We use cookies to improve user experience and analyze our website traffic as stated in our Privacy Policy. By using this website, you agree to the use of cookies unless you have disabled them.