Request InfoNovanta IMSThe SF-100 rotational substrate stage from Intelligent Micro Patterning LLC enables precise maskless patterning on cylindrical surfaces. An add-on to the company’s maskless micropatterning system, the stage provides highly controllable and repeatable patterning of cylindrical substrates using standard photolithographical materials and techniques. Pattern features as small as 10 μm are possible with the device, which also offers low backlash, high-output torque, Windows-based operating software, and easily and quickly modifiable mounting positions.See full productRelated content from Photonics MediaWEBINARSPhotonics.com 10/27/2021Fiber Optic Solutions for Medical DevicesSteve Allen provides a brief overview and examples of procedures that continue to push adoption and proliferation of optical fiber-based medical devices. From cosmetic surgery to cutting-edge sensing...Photonics.com 1/9/2023Innovations in Ultrashort-Pulse and RF-Excited CO2 Lasers Expand Materials Processing ApplicationsIndustrial laser materials processing is constantly evolving. Industries as varied as pharmaceutical, consumer electronics, automotive, aerospace, and textiles, among others, have benefited from new...Photonics.com 1/12/2023A Proven, Portable, and PIC-Based Methodology for Cultivating a Next-Generation WorkforceWith the passage of the CHIPS and Science Act and growing demand for photonic integrated circuit technology, the semiconductor industry is once again gaining momentum. But even as the U.S. rebuilds...Photonics.com 1/18/2018Fiberguide RARe Motheye Fiber: Random Anti-Reflective (RARe) Nanostructures on Optical Fibers as Replacement for AR CoatingsAnti-reflective (AR) coatings are now entering their second century and have remained virtually unchanged throughout their life. As power level and wavelength range requirements continue to increase,...