Request InfoIllumination system for mask alignersSUSS MicroTec SEGARCHING, Germany, June 16, 2009 – Suss MicroTec Lithography GmbH has launched an illumination system with patent-pending high-resolution MO exposure optics designed for all generations of the company’s manual and automatic mask aligners. The new optical system is based on microlens arrays of high optical quality to provide higher intensity, improved exposure light uniformity and customized illumination shaping. This allows users of proprietary mask aligners to optimize the process window and enhance yield in contact and proximity lithography. 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