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Stanley Electric Co. Ltd. - IR Light Sources 4/24 LB

NESSY 1900

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Buhler Inc., Business Area Leybold Optics
Advanced sputtering system for x-ray mirrors for EUV lithography. • DC or DC pulsed sputtering coating technology. • Mo, Si, Cr, Sc, and different materials for diffusion-barrier layers and capping layers. • Sputter source: Up to 6 PK; 600 × 125 mm. • Base pressure: 9 × 10–9 mbar. • Planetary-drive speed: 0–5 rpm. • Rotation-table speed: 0–500 rpm.See full product

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