Request InfoPlasma Etch Inc.CARSON CITY, Nev., Oct. 12, 2011 — Plasma Etch has introduced a plasma system that incorporates two individual plasma etching/cleaning-type-mode technologies into one complete stand-alone plasma etching/cleaning system. The PE-100 Convertible allows the user to switch back and forth between reactive ion etch anisotropic type etching mode applications and isotropic-type etching/cleaning mode applications. Traditionally, two separate stand-alone plasma systems were necessary to achieve this. 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