Request InfoIbsen Photonics A/SIbsen Photonics A/S has announced 2-D phase masks for single-exposure production of square lattice grating structures. Featuring ±0.01-nm period accuracy, the masks allow one-step exposure of 2-D grating structures over large grating areas. They can be used with laser illumination or in a volume-production-oriented near-field holography mask aligner process. The masks are usable for grating periods from 200 to 687 nm and are optimized to operate under wavelengths from 193 to 435 nm. They are suitable for display technology, solar cells, photonic crystals, biochip matrices and...See full productRelated content from Photonics MediaPRODUCTSPhotonics.com 7/21/2023Edge ComputerThe Helix 511 Edge Computer from OnLogic is a compact and fanless device designed for use in challenging industrial environments such as manufacturing, automation, and energy management. 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