Request InfoLogitech Ltd.Logitech says its CDP polishing machine produces laser-quality surfaces and improves surface topography. Designed for delayering and chemical mechanical polishing, the system allows nanometer-level removal on an individual die or on wafers up to 8 in. in diameter. It is suitable for applications such as hard-substrate polishing, epi-ready surface preparation and wafer reclamation. The CDP system, which can be used with acid and alkaline slurries, features a 20-in.-diameter processing plate, a wafer/die carrier and an independent conditioner head.See full productRelated content from Photonics MediaPRODUCTSPhotonics Spectra November 2022 IssueLaser Line Profile SensorsThe Gocator® 2600 series of smart 3D laser line profile sensors from LMI Technologies Inc. feature a resolution of 4K+. 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