Search
Menu
Spectrogon US - Optical Filters 2024 LB

Photomask Tuning System

Facebook X LinkedIn Email
Request InfoJENA, Germany, Sept. 12, 2016 — Carl Zeiss AG has announced the ForTune photomask tuning system. Combining capabilities from the company’s CDC and RegC devices in a new advanced system, the mask registration and critical dimension uniformity can be completed in one process. The system also helps expand the lithography process window, reduce the wafer intrafield hot spots, improve wafer intra-field on-product overlay and enhance mask image placement. The ForTune provides high process efficiency and prediction accuracy, as well as an improved output.See full product

Related content from Photonics Media



    PRODUCTS


    ARTICLES


    PHOTONICS HANDBOOK ARTICLES


    WHITEPAPERS


    WEBINARS


    PHOTONICS DICTIONARY+ TERMS


    VIDEOS


    PHOTONICS BUYERS' GUIDE CATEGORIES


    COMPANIES


    We use cookies to improve user experience and analyze our website traffic as stated in our Privacy Policy. By using this website, you agree to the use of cookies unless you have disabled them.