Request InfoJENA, Germany, Sept. 12, 2016 — Carl Zeiss AG has announced the ForTune photomask tuning system. Combining capabilities from the company’s CDC and RegC devices in a new advanced system, the mask registration and critical dimension uniformity can be completed in one process. The system also helps expand the lithography process window, reduce the wafer intrafield hot spots, improve wafer intra-field on-product overlay and enhance mask image placement. The ForTune provides high process efficiency and prediction accuracy, as well as an improved output.See full productRelated content from Photonics MediaPRODUCTSPhotonics Spectra July 2023 IssueIR Laser DiodeThe SPL PL90AT03 IR laser diode from ams OSRAM offers 75-W peak power and narrow 110-µm aperture for performance in long-distance lidar and time-of-flight sensing applications. 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