Request InfoSUSS MicroTec SEGARCHING BEI MUNCHEN, Germany, May 26, 2016 — Suss Microtec Lithography GmbH has announced the LI Laser Imaging series, a versatile surface processing platform. Process capabilities of the system range from submicron patterning of resist coated substrates to micro-ablation, photo-chemistry treatment and metrology. A lens focusing set is included in the base system. It is also possible to process small wafer pieces and add a second laser source of choice. Multiple patterning modes are available. The system is suited for academic and industrial R&D facilities. Main applications include nano- and 3D structuring for...See full productRelated content from Photonics MediaPRODUCTSPhotonics.com 6/29/2023Trajectory Planning SoftwareSCANLAB’s SCANmotionControl is a trajectory planning software for scan systems, designed to accurately track dynamic-limited setpoints. 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