Request InfoFilmetrics, KLA InstrumentsThe F50 thin-film thickness mapping system from Filmetrics Inc. is designed for semiconductor wafer characterization and optical coating. It automatically measures the thickness of oxides, nitrides, resists, polymers and other films used in silicon, III-V and LCD fabrication. Films between 20 nm and 30 µm thick can be measured on substrates up to 8 in. in diameter. The system also models and characterizes complex multilayer optoelectronic structures such as vertical-cavity lasers and distributed Bragg reflectors.See full productRelated content from Photonics MediaWEBINARSPhotonics.com 1/9/2023Innovations in Ultrashort-Pulse and RF-Excited CO2 Lasers Expand Materials Processing ApplicationsIndustrial laser materials processing is constantly evolving. Industries as varied as pharmaceutical, consumer electronics, automotive, aerospace, and textiles, among others, have benefited from new...Photonics.com 1/12/2023A Proven, Portable, and PIC-Based Methodology for Cultivating a Next-Generation WorkforceWith the passage of the CHIPS and Science Act and growing demand for photonic integrated circuit technology, the semiconductor industry is once again gaining momentum. But even as the U.S. rebuilds...Photonics.com 6/30/2021European Photonics Manufacturing Services Funded by ECThis event is supported by the European initiatives presented and is moderated by EPIC, the European Photonics Industry Consortium. The European Commission is helping companies access the...Photonics.com 10/27/2021Fiber Optic Solutions for Medical DevicesSteve Allen provides a brief overview and examples of procedures that continue to push adoption and proliferation of optical fiber-based medical devices. From cosmetic surgery to cutting-edge sensing...