Request InfoKurt J. Lesker Co.Kurt J. Lesker Co. has developed a generation of Torus UHV sputtering sources that are compatible with vacuum systems designed to reach base pressures below 10-10 t. They have no O-rings, and the magnet assembly is removable without breaking the vacuum, allowing for 350 °C chamber bake-out. The magnet arrays can be adjusted in situ so the user can sputter both magnetic and nonmagnetic materials. The sources are suitable for magnetic storage devices, superconducting materials, semiconductor fabrication and other applications that require ultrapure thin films.See full productRelated content from Photonics MediaWEBINARSPhotonics.com 1/12/2023A Proven, Portable, and PIC-Based Methodology for Cultivating a Next-Generation WorkforceWith the passage of the CHIPS and Science Act and growing demand for photonic integrated circuit technology, the semiconductor industry is once again gaining momentum. But even as the U.S. rebuilds...Photonics.com 7/22/2021STANDARDS UPDATE: Vision Standards: An Overview of Global and A3 DevelopmentsStandards play a key role in the vision and imaging industry by ensuring interoperability of components, increasing market size, and shortening the time it takes to get new products to market. As the...Photonics.com 3/27/2024Precision Planning: Simplified Laser Scanning with Predictive SoftwareConventional controllers for laser scan systems do not allow to predict the actual path of the laser beam on the work piece. A tedious process of testing different parameters and delay settings...Photonics.com 7/20/2023Motorized and Calibrated Lenses for Machine Vision ApplicationsMany applications have benefited from motorized varifocal lenses that allow automatic or remote adjustment of focus distance and field of view. Applications may need to change the focal length or...