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SMT-9700 Sensor System

Kaman Precision Products, Measuring SystemsRequest Info
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MIDDLETOWN, Conn., Aug. 3, 2011 — Kaman Precision Products | Measuring’s SMT-9700 system uses inductive (eddy current) technology to provide nanometer/subnanometer resolution, noncontact position/displacement feedback of virtually any electrically conductive target. It is suitable for applications requiring high-resolution position feedback for control and has been used for optics positioning in photolithography equipment, X-Y-Z stage positioning in atomic force microscopy, and spindle positioning in the fluid-drenched environment of bearing race precision grinding equipment.

Performance flexibility makes the SMT-9700 useful for the OEM. The company can vary the frequency response and linearity or a combination thereof to achieve high performance. Calibrated range and sensor size can be chosen according to application needs.

The company’s computer modeling provides expected performance specifications before commitment to hardware.

To meet OEM requirements, the RoHS- and CE-compliant system is offered in one-, two- and three-channel configurations with 13 sensor options covering full-scale ranges from 100 μm to 25 mm. The sensors can be customized to meet physical and environmental constraints of the application and can be calibrated to a specific target material, size and shape.

For all inquiries, company applications engineers will review the performance requirements — considering the required calibrated range, linearity, thermal sensitivity, resolution and repeatability — and recommend the appropriate system.
Aug 2011

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AmericasBasic ScienceCE-compliant sensor systemConnecticutinductive eddy current technologyindustrialKamanMicroscopynanometer/subnanometer-resolution sensornoncontact optics positioning in photolithography equipmentposition and displacement feedback on electrically conductive targetsProductsRoHS-compliant sensor systemSensors & DetectorsSMT-9700 sensor systemspindle positioning in grinding equipmentTest & MeasurementX-Y-Z stage positioning in AFMX-Y-Z stage positioning in atomic force microscopy

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