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Semiconductor Metrology Platform

Atonarp Inc.Request Info
 
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TOKYO, July 20, 2021 — Semiconductor Metrology PlatformThe Aston metrology platform from Atonarp Inc. aims to increase yield, throughput, and efficiency in semiconductor manufacturing processes.

The in situ platform features an integrated plasma ionization source. It can replace multiple legacy tools and provide high levels of control across a comprehensive set of applications including lithography, dielectric and conductive etch and deposition, chamber clean, chamber matching, and abatement.

Aston optimizes production by detecting exactly when a process has finished, including chamber cleaning, which can reduce required clean time. It is resistant to corrosive gases and gaseous contaminant condensates, featuring independent dual ionization sources that work reliably in harsh conditions.


Photonics.com
Jul 2021
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ProductsSemiconductor Metrology PlatformAstonAtonarpindustrialmetrologysemiconductorsAsia-Pacific

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