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Semiconductor Metrology System

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Semiconductor Metrology SystemThe Park NX-Hybrid WLI semiconductor metrology system from Park Systems Corp. combines atomic force microscopy (AMF) with white light interferometer profilometry, forming a comprehensive automated metrology system.

The metrology solution is designed for semiconductor applications requiring both large-area scanning and nanoscale metrology. The integrated system is based on the Park NX-Wafer, an automated atomic force microscopy system for semiconductor and related device manufacturing, in-line quality assurance, and R&D. High throughput imaging is provided over a large area, with nanoscale metrology with sub-angstrom height resolution over the areas of interest. Defects of a patterned structure can be detected by comparing images of reference and target sample areas using high-speed hot spot detection, a technique that enables fast localization of defect sites for high-resolution AFM review.

The Park NX-Hybrid supports objective lens magnification of 2.5, 10, 20, 50, and 100 ×, featuring a CMOS camera.

Photonics Spectra
Feb 2022
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ProductsPark NX-Hybrid WLIsemiconductor metrology systemPark SystemsMicroscopyopticsmetrologyTest & Measurementsensor & detectorssemiconductorsimagingindustrialR&DAsia-Pacific

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