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UCS 120 Cleaning Line for Optics

Photonics Showcase
Jul 2011Buhler Inc., Business Area Leybold OpticsRequest Info
 
The UCS 120 has been designed to prepare precision optics up to 8-in. wafer diameter for vacuum deposition. The process guarantees a high degree of cleaning and can be used on other interstage cleaning operations. This very compact multistage cleaning system stands on casters. Typical substrate size is 10 to 220 mm, and the cycle time is 4 to 5 min per stage. The production capacity for 8-in. wafers is 60 per hour

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