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Wafer Plane Analysis Tool

D2S Inc.
 
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SAN JOSE, Calif., April 9, 2020 — The TrueMask® Wafer Plane Analysis (WPA) tool from D2S Inc. is a graphic processing unit-accelerated aerial simulation tool.

The system integrates with mask CD-SEM systems to provide fast, highly accurate, and highly repeatable CD metrology for complex and curvilinear mask shapes. It has also been extended for use with EUV photomasks to assess the wafer impact from the mask images and help benefit semiconductor manufacturing.

The TrueMask WPA enables mask shops to leverage existing CD-SEM equipment to identify mask-level CD uniformity issues that will impact the wafer during subsequent lithography processing.

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