X-ray Fluorescence Analytical System
Rigaku Corp.Request Info
TOKYO, Sept. 4, 2025 — 
XHEMIS TX-3000 from Rigaku is a total reflection x-ray fluorescence system that supports analysis of trace contamination on wafer surfaces in semiconductor manufacturing. Compared to Rigaku’s previous models, the XHEMIS TX-3000 has 6x faster processing speeds and a tripled measurement speed. To achieve its measurement speed, the XHEMIS TX-3000 uses an optical array with a multi-element detector. It has an AI-driven spectrum forecasting technology to double measurement speed without losing precision. The XHEMIS TX-3000 has an x-ray source that can be switched among three wavelengths, which enables analysis of lighter elements that are difficult to detect using fluorescent x-ray analytical systems. It has a monochromator capable of x-ray irradiation with a multi-element detector that can measure three locations on the wafer surface simultaneously. XHEMIS TX-3000 features technology that reduces unnecessary background signal, expanding the range of applications to a wide variety of materials previously unamenable to trace-contamination measurement.
https://rigaku.com
/Buyers-Guide/Rigaku-Corp/c34640
Published: September 2025
From the Photonics Marketplace
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