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Gigaphoton Products
Light Sources
OYAMA, Japan, April 6, 2020 — Gigaphoton Inc. has announced two new light sources for use in semiconductor lithography. The GT66A ArF immersion laser is equipped with a newly developed optical module to reduce spatial coherence and improve beam uniformity on the exposed surface. The G60K KrF light source has undergone a full model change, increasing power output by a factor of 1.5× compared to the existing model by introducing a new power supply unit.
Gigaphoton Inc.
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Excimer Lasers
OYAMA, Japan, June 28, 2016 — Gigaphoton Inc. has announced the Giganex series of excimer lasers for annealing. By incorporating ultracompact laser annealing process characteristics into the existing amorphous silicon (a-Si) panel manufacturing process, crystallizing the...
Gigaphoton Inc.
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Laser Monitoring Software
OYAMA, Japan, July 13, 2015 — Gigaphoton Inc. has announced new Web-based monitoring software for excimer lasers used in semiconductor manufacturing. REDeeM Cloud is designed to help users collaboratively analyze performance data and minimize downtime. In the future,...
Gigaphoton Inc.
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Excimer Laser
OYAMA, Japan, Feb. 17, 2015 — Gigaphoton Inc.’s newest ArF excimer lithography laser is equipped with environment- and cost-friendly gas- and electricity-reduction technologies. The GT64A4’s open platform is capable of supporting many kinds of collaborative...
Gigaphoton Inc.
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ArF Immersion Lasers
OYAMA, Japan, Sept. 29, 2014 — New argon fluoride (ArF) immersion lasers from Gigaphoton Inc. offer enhanced efficiency and output for semiconductor lithography processing. The eGRYCOS (e-GIGAPHOTON Recycle Chamber Operation System) features a hydrodynamically optimized gas...
Gigaphoton Inc.
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GT64A ArF Excimer Laser
OYAMA, Japan, April 4, 2013 — Lithography light source manufacturer Gigaphoton Inc. has enhanced its ArF platform with the GT64A, an excimer laser that achieves power levels of up to 120 W for multipatterning in 450-mm wafer production. The system offers the same...
Gigaphoton Inc.
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ArF Excimer Laser
OYAMA, Japan, Feb. 14, 2012 — Gigaphoton Inc. is introducing the GT63A, a next-generation deep-UV ArF excimer laser for multipatterning immersion lithography scanners. The laser incorporates sMPL (spectrum multipositioning LNM)*1, a spectrum control (“focus...
Gigaphoton Inc.
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May 2024
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