UV Radiation Spectrometer
CHELMSFORD, Mass., Feb. 16, 2010 — With the model 234/302 from McPherson Inc., users can quickly and easily measure vacuum ultraviolet (VUV) spectral emission (signature emission from He, Ar, Xe, N2, O2 and many corrosive fluoride or chloride-based mixtures) in experiments such as plasma process mapping (semiconductor etch plasma formation and distribution), fluorescence (nanomaterials, doped crystals), luminescence (phosphor characteristics) and VUV photoemission. Other applications include fusion plasma diagnostics and...
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