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lithography News
Toshiba Develops 32nm CMOS Platform Tech
Dec 22, 2008 — Toshiba Corp. of Tokyo has announced a cost-effective 32-nm CMOS platform technology that offers higher density and improved performance while halving the cost per function from 45-nm processes. The platform was created by applying single-exposure lithography and gate-first metal gate/high-K process technology. It enables a 0.124 µm2 SRAM cell and a gate density of 3650 gate/mm2. The platform is based on a 32-nm process developed jointly with NEC Electronics Corp. The strict design rule in the...
Ocean Optics Acquires Unit
DUNEDIN, Fla., Dec. 2, 2008 -- Ocean Optics Inc. has acquired the Oerlikon Optics business unit in Golden, Colo. for an undisclosed amount and will integrate it into its Thin Films Div., the company announced last week. Oerlikon Optics USA is a supplier of custom optical...
Plasmons Power Patterning
BERKELEY, Calif., Oct. 23, 2008 -- A new lithography process that resembles a needle playing an album on a traditional LP turntable uses plasmonic lenses as "optical styluses" and could make microprocessors much smaller and more powerful and create disks that hold 10 to 100 times...
Show Bigger, Even Better
SAN JOSE, Calif., Oct. 22, 2008 -- Four renowned symposia featuring the presentations of 3275 research papers by the brightest minds in the photonics industry, 85 conferences, 75 courses, 1100 exhibitors and a special two-day Career Fair are expected to make SPIE Photonics West 2009...
Show to be Bigger, Even Better
SAN JOSE, Calif., Oct. 22, 2008 -- Four renowned symposia featuring the presentations of 3275 research papers by the brightest minds in the photonics industry, 85 conferences, 75 courses, 1100 exhibitors and a special two-day Career Fair are expected to make SPIE Photonics West 2009...
Zeiss Invests in Nanoscribe
OBERKOCHEN, Germany, Oct. 3, 2008 -- Oberkochen-based optical company Carl Zeiss announced it has acquired a 40 percent stake in startup Nanoscribe GmbH, a developer of laser direct-write tools for 3-D nanostructuring. Specific terms of the deal were not disclosed. Nanoscribe,...
Molecular Imprints Hires 2 VPs
Jul 3, 2008 — Nanopatterning systems provider Molecular Imprints Inc. of Austin, Texas, announced that Ben Eynon and Paul Hofemann have joined its management team as vice president of marketing and business development for semiconductors, and vice president of...
“Bow Tie” Enhances EUV
DAEJEON, Korea, June 9, 2008 -- According to KAIST reseachers in Korea, a bow tie-shaped gold nanostructure on a saphire substrate can enhance the intensity of femtosecond laser light pulses by two orders of magnitude. The devise is smaller and cheaper than existing systems...
Moving EUVL From Lab to Fab
MAUI, Hawaii, June 3, 2008 -- More than 100 leading lithographers will meet in Maui next week to begin developing a plan to speed the introduction of extreme ultraviolet lithography (EUVL) into high-volume semiconductor manufacturing. The effort will take place June 10-12 at...
Moving EUVL From Lab to Fab
MAUI, Hawaii, June 3, 2008 -- More than 100 leading lithographers will meet in Maui next week to begin developing a plan to speed the introduction of extreme ultraviolet lithography (EUVL) into high-volume semiconductor manufacturing. The effort will take place June 10-12 at...
Carl Zeiss SMT to Open NA HQ
Apr 22, 2008 — Carl Zeiss SMT AG, a maker of scanning and transmission electron beam systems for nanotechnology, life sciences, material analysis and semiconductor applications, said it will mark the official opening of its new North American headquarters tomorrow...
Rudolph Joins Sematech Metrology Program at CNSE
Feb 22, 2008 — Rudolph Technologies Inc. of Flanders, N.J., announced that it is the first semiconductor equipment supplier to join Sematech's metrology program at the College of Nanoscale Science and Engineering (CNSE), located at the University at Albany. Under...
Brighter LEDs Eyed for Homes
GLASGOW, Scotland, Jan. 9, 2008 -- Nanoimprint lithography techniques that increase the brightness of LEDs could enable the solid-state lighting to replace incandescent lightbulbs in homes within three years. LEDs, currently used in electrical equipment such as computers and cell...
Xidex to Make CNT Emitters for Electron Microscopes
Dec 4, 2007 — Xidex Corp., an Austin, Texas-based nanotechnology company, today announced it has been awarded a new contract from the Department of Energy (DoE) to manufacture carbon nanotube (CNT) field emitters on metal substrates that can be integrated into...
UBath Nanotech Facility Free for UK University Researchers
Nov 16, 2007 — Scientists and engineers from UK universities will be allowed free use of the University of Bath's nanotechnology facilities to assist their research, the university announced this week. The David Bullett Nanofabrication Facility will be set aside...
Nano Conference Debuts
ORLANDO, Fla., Oct. 17, 2007 -- The International Congress on Applications of Lasers and Electro-Optics (ICALEO) will feature its inaugural conference on the emerging field of nanomanufacturing as one of its three major technical conferences this year. ICALEO 2007 will be held...
Nano Conference Debuts
ORLANDO, Fla., Oct. 17, 2007 -- The International Congress on Applications of Lasers and Electro-Optics (ICALEO) will feature its inaugural conference on the emerging field of nanomanufacturing as one of its three major technical conferences this year. ICALEO 2007 will be held...
EUV Lithography Improved
CHAMPAIGN, Ill., Sept. 12, 2007 -- Light has been generated and optics damage lessened in extreme ultraviolet lithography by adding a lighter gas to plasma. The microelectronics lithography method is considered a candidate for creating a new generation of smaller, more powerful...
Patterning Films with Fewer Steps
Sep 1, 2007 — A team of researchers from the University of Illinois at Urbana-Champaign and from Anvik Corp. of Hawthorne, N.Y., has demonstrated a fabrication technique that inscribes patterns onto thin films of indium tin oxide in fewer steps than are typically...
Zecotek Completes Green Fiber Laser Development, Files for Patent
Aug 9, 2007 — Biophotonics technology developer Zecotek Medical Systems Inc. of Vancouver, British Columbia, announced yesterday that it has completed the creation of a fiber laser that operates in all known wavelengths of the green spectral range and has filed...
Patrick Tang Joins Surfect as VP Asia
Jul 27, 2007 — Surfect Technologies Inc. of Albuquerque, N.M., provider of a single-cell electroplating tool and process solution to the semiconductor industry, announced this week it has named Patrick Tang as vice president and general manager of the Asia region...
Chip Consortium Plans $600M UAlbany Expansion
ALBANY, N.Y., May 10, 2007 -- International Sematech, the research and development arm of Sematech, a consortium of international nanoelectronics manufacturers, will expand its operations at the University of Albany NanoCollege under a $600 million agreement announced yesterday....
Electrospinning Creates Tiniest Light-Emitting Devices
ITHACA, N.Y., April 12, 2007 -- The smallest organic light-emitting devices to date have been created, so tiny that they are shorter than the wavelength of light they emit. Potential applications for these "nanolamps," which are about the size of a virus or bacteria, include...
Newly Created Molecules Drive Lithography Technique
ATLANTA, March 30, 2007 -- New two-photon absorbing molecules that are sensitive to light at short wavelengths are helping to produce 3-D polymer line structures as small as 65 nm wide. The 3-D multiphoton lithography technique could compete with existing processes for making...
Ultratech CEO Named Director Emeritus of SEMI
Mar 21, 2007 — Arthur W. Zafiropoulo, chairman and CEO of Ultratech Inc., has been appointed director emeritus on the board of industry association Semiconductor Equipment and Materials International (SEMI), it was announced today. Zafiropoulo served as chairman...
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May 2024
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