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photolithography applications Products
EXCIMER LIGHT SOURCE
Jun 1, 2004 — Cymer Inc. has announced the XLA 105 argon-fluoride excimer light source, which supports 65-nm photolithography applications. It operates at a 4-kHz repetition rate, outputs at 40 W and provides full imaging capability for 200- and 300-mm...
Cymer Inc.
Request info >
DEEP-UV LIGHT SOURCE
May 1, 2004 — The XLA 105 argon-fluoride excimer light source manufactured by Cymer Inc. is designed to support 65-nm photolithography applications. Based on proprietary master oscillator power amplifier dual-gas-discharge-chamber technology, it is intended for...
Cymer Inc.
Request info >
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May 2024
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