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photoresist Products
Electron Beam Metrology System
SANTA CLARA, Calif., March 27, 2023 — Applied Materials’ VeritySEM® 10 CD-SEM metrology system is designed to precisely measure the critical dimensions of semiconductor device features patterned with EUV and emerging High-NA EUV lithography. The system architecture enables low...
Applied Materials
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NSX 320 Metrology System
FLANDERS, N.J., Aug. 7, 2013 — Rudolph Technologies Inc. has released three application-specific configurations of its NSX 320 automated macro-defect inspection system for wafer-level packaging, 2.5D interposers and 3DICs (3-D integrated circuits) using through-silicon via as...
Rudolph Technologies Inc.
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Immersion BARC
Jul 1, 2010 — Brewer Science has launched the ARC29L coating, a state-of-the-art argon-fluoride immersion bottom antireflection coating (BARC) that provides broad photoresist compatibility and tuned optical properties for use as a top layer in a dual-layer BARC...
Brewer Science Inc.
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Reactive Ion Etching
Oct 1, 2009 — Plasma Etch Inc. has introduced a reactive ion etching (RIE) version of its BT1 plasma system. The BT1-RIE performs fast anisotropic removal of photoresist, nitrides, oxides, polyimides and diamondlike carbon films. It includes a water-cooled RIE...
Plasma Etch Inc.
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May 2024
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Features
Rare-Earth Doped Fibers Deliver Critical Elements to Dynamic Systems
Photonics Spectra
, May 2024
Bottlenecks in Process and Production Hinder Micro-LED Adoption
Photonics Spectra
, May 2024
Beam Deflection Units Increase the Efficiency of Laser Powder Bed Fusion
Photonics Spectra
, May 2024
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