Nanopositioning refers to the precise and controlled movement or manipulation of objects or components at the nanometer scale. This technology enables the positioning of objects with extremely high accuracy and resolution, typically in the range of...

In photonics, a lattice refers to a periodic arrangement of optical elements or structures, often on a microscopic or...

Optical elements, often created by micromachining, lithography or vacuum deposition, that rely on diffraction of the...

Photoresist is a light-sensitive material used in photolithography processes, particularly in the fabrication of...

A lithography method that allows the transfer of fine-pitch gratings from a phase mask into photoresist. The exposure takes...

In photolithography, an opaque material used in masks that has a lower optical density and grainier composition than chrome.

Photolithography is a key process in the manufacturing of semiconductor devices, integrated circuits, and...

In the context of electronics and semiconductor manufacturing, a wafer refers to a thin, flat disk or substrate made of a...

Extreme ultraviolet (EUV) refers to a specific range of electromagnetic radiation in the ultraviolet part of the spectrum....

Additive manufacturing (AM), also known as 3D printing, is a manufacturing process that involves creating three-dimensional...

A method of creating real three-dimensional models by using lasers driven by CAD software. In contrast to the normal...

An artificial material, engineered to have a negative refractive index value, such that light or any other form of...

1. A framelike structure that serves to restrict the viewing area of the screen when placed before a television picture...

In optics and photolithography, a phase mask refers to a device that modifies the phase of light waves passing through it....

A beam shaper is an optical device or system designed to modify the spatial profile or intensity distribution of a laser or...

An electron-beam lithography (EBL) system is a sophisticated nanofabrication tool used in the semiconductor industry and...

A technique used in photolithography of computer chips to compensate for errors caused by the proximity effect, which...

In the context of thin film deposition processes such as evaporation or sputtering, masks are used to selectively deposit...

A method of projecting integrated circuit patterns on a silicon wafer using x-ray wavelengths focused through a special mask.

Micro-optics refers to the design, fabrication, and application of optical components and systems at a microscale level....

Fused quartz and silica are closely related materials, both composed primarily of silicon dioxide (SiO2), but they are...

An electron-gun system is an assembly used to generate and control a focused beam of electrons. Electron guns find...

An advanced magnetic device used in x-ray lithography to beam x-rays onto the surface of silicon wafers used for...

Deep ultraviolet (DUV or deep-UV) refers to a specific range of ultraviolet light with shorter wavelengths than those in the...

Lithography is a key process used in microfabrication and semiconductor manufacturing to create intricate patterns on the...

An excimer laser is a type of ultraviolet laser that emits short pulses of light in the ultraviolet spectrum. The term...

The underexposure caused by the diffraction of light passing through small openings spaced closely together in masks used in...

A technique for producing micron-size structures on surfaces by using short-wavelength light or electron beams.

Nanoimprint lithography (NIL) is a nanolithography technique used for fabricating nanoscale patterns on a substrate. It is a...

A photomask, also known simply as a mask or reticle, is a key component in the photolithography process used in...

Photonic crystals are artificial structures or materials designed to manipulate and control the flow of light in a manner...