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plasma News
Femtosecond Laser May Divert Lightning
TUCSON, Ariz. and ORLANDO, Fla., April 3, 2014 — A long-range femtosecond laser under development could be used to steer lightning away from buildings. Optical scientists at the University of Arizona and the University of Central Florida are working on the technology, which uses a low-intensity laser beam to surround and give greater coherence to a high-intensity beam. The resulting filament would leave a channel of plasma in its wake that could be used as a path of least resistance to attract and channel lightning
OIPT Opens Office in India
ABINGDON, England, Dec. 2, 2013 — To meet increased demand for its products, Oxford Instruments Plasma Technology (OIPT) has opened a direct sales and service office in India. The Oxford Instruments Plasma Technology India team includes Vipin Kala, sales manager (left), and Gurpal...
CyberOptics Appoints Executive Chairman
MINNEAPOLIS, Sept. 19, 2013 — Sensors and inspection systems maker CyberOptics Corp. has appointed Dr. Subodh Kulkarni as executive chairman. Kulkarni is a CyberOptics director and owner and CEO of Prism Computational Sciences, a developer of software tools for control of...
Conference to Explore Laser-based Weather Control
GENEVA, Aug. 30, 2013 — Ultrashort-pulse lasers as an emerging tool for controlling the weather will be the topic of interest at a gathering of atmospheric physicists, meteorologists and climatologists next month at the World Meteorological Organisation in Geneva. The...
Same-Energy Electrons Pulsed from Laser Accelerator
GARCHING, Germany, June 3, 2012 — Electron pulses — all with nearly the same tunable energy — have been produced from a laser accelerator. The accomplishment makes electrons, which travel at a velocity close to the speed of light, easier to control as a tool for...
Atoms hollowed by laser form novel plasma
YORK, England – A highly unusual plasma composed of hollow atoms has been created using one of the world’s most powerful lasers. The surprising result shows that a little-explored region of physics is now accessible through the unprecedented intensities being...
Atoms hollowed by laser form novel plasma
YORK, England – A highly unusual plasma composed of hollow atoms has been created using one of the world’s most powerful lasers. The surprising result shows that a little-explored region of physics is now accessible through the unprecedented intensities being...
Atoms Hollowed by Laser Form Novel Plasma
YORK, England, April 1, 2013 — A highly unusual plasma composed of hollow atoms has been created using one of the world’s most powerful lasers. The surprising result shows that a little-explored region of physics is now accessible through the unprecedented intensities being...
Plasma’s potential for photolithography pursued
SEATTLE – Work over the past decade to harness the energy-generating mechanism of the sun has yielded bright high-energy light needed to etch smaller microchips. The microchip industry now uses 193-nm UV light, which cannot etch circuits any smaller than...
Laser Breaks Neutron Beam Record
LOS ALAMOS, N.M., July 12, 2012 — The largest neutron beam ever achieved using a short-pulse laser could lead to more advanced materials measurement.
Plasma’s Potential for Photolithography Pursued
SEATTLE, July 3, 2012 — Fusion energy work over the past decade to harness the energy-generating mechanism of the sun has now yielded bright high-energy light needed to etch smaller microchips.
EUV Frequency Comb Debuts
BOULDER, Colo., Feb. 6, 2012 — The first “frequency comb” in the extreme ultraviolet band has the potential to advance nuclear clocks and to measure previously unexplored behavior in atoms and molecules.
Microplasma arrays promise to revolutionize lighting
ARLINGTON, Va. – A new plasma-based lighting system comprising microcavity arrays produces inexpensive, wafer-thin, flexible sheets of light – and its creators say it will revolutionize illumination. Just as in a fluorescent light, a microcavity array is...
Plasma Expands Under Ultrafast Beams
WEST LAFAYETTE, Ind., Dec. 20, 2012 — New insight into the behavior of ultrafast laser pulses could improve their performance in manufacturing, diagnostics and other research. A laser's pulse at durations of 100 fs, or quadrillionths of a second, causes electrons to reach...
New Lighting Approach Is a Gas
WASHINGTON, Nov. 28, 2011 — Just as in a fluorescent light, a microcavity array (MCA) is energized by an applied voltage. By successfully confining plasma (an ionized gas) in parallel rows of microcavities within thin sheet materials, various implementations of microplasma...
Plasma Source Enables High-Volume Manufacturing with EUV Lithography
Sep 1, 2011 — As the lithography capital equipment sector moves toward early field deployment of extreme-ultraviolet (EUV) scanners and support, the 13.5-nm EUV energy source continues to be a key factor in the ultimate adoption and economic success of the...
Smaller Features, Faster Wafers
WEST LAFAYETTE, Ind., Dec. 16, 2010 — The manufacturing of semiconductor wafers used in all types of electronics involves etching small features onto a wafer with lasers. This process ultimately is limited by the wavelength of the light itself. The semiconductor industry is rapidly...
Plasma Acts as a Fast Optical Switch
LOS ALAMOS, N.M., Nov. 9, 2010 — Just like an electrical switch allows the flow of electricity into electrical circuits, relativistic transparency in plasma can act like a fast optical switch allowing the flow of light through otherwise opaque plasma. An ultrahigh intensity...
Arbor Photonics Wins Fiber Laser Funding
ANN ARBOR, Mich., Sept. 23, 2010 — Fiber laser solutions provider Arbor Photonics Inc. has received SBIR Phase IB funding from the National Science Foundation for its work on “High Power Pulsed Fiber Lasers for EUV Lithography.” The supplemental award will support...
Ocean Optics LIBS IDs Fake Antiques
DUNEDIN, Fla., Aug. 25, 2010 — To separate authentic ceramic antiques from fakes, nationally recognized antiques appraiser Guan Haisen has employed an Ocean Optics LIBS system, with QE65000 spectrometer, to help him identify artificially aged ceramics and artifacts. Using...
To Step Up, Semiconductor Lithography Steps Down – Way Down
Aug 1, 2010 — For semiconductors, smaller is better. That’s why the industry may soon take a big step down. On the horizon is a switch from 193- to 13.5-nm-wavelength lithography. This extreme-ultraviolet (EUV) technology eventually could allow an almost...
Edinburgh Instruments Names New CEO
EDINBURGH, Scotland, July 8, 2010 — Edinburgh Instruments (EI) Ltd., a supplier of lasers, spectrometers and gas sensor equipment, announced today it has hired Alan Faichney as its CEO, effective June 14. EI founder and former CEO S.D. Smith remains as chief scientific officer and as...
Plasma-Therm Sells 3 Versaline PECVD Systems
ST. PETERSBURG, Fla., April 29, 2010 — Plasma process equipment supplier, Plasma-Therm LLC announced that it has sold three Versaline PECVD systems to a South Korean LED manufacturer. The systems were purchased to meet the capacity expansion needs for high-quality dielectric film...
Dialing up the laser power
AUSTIN, Texas – Over the past 20 years, physicists have been steadily stepping up the power of lasers from the previously impressive terawatt level to the recently realized petawatt level. Now, researchers at the University of Texas are working toward building the...
SRC, UNT Establish Semiconductor Center
RESEARCH TRIANGLE PARK, N.C. and DENTON, Texas, March 25, 2010 – Semiconductor Research Corp. (SRC), a university-research consortium for semiconductors and related technologies, and the University of North Texas (UNT) announced the formation of a new research center that focuses on advanced plasma processes and...
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May 2024
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