Transition Mode Reactive Sputtering Using PEM

Mar 15, 2017
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Presented by
Denton Vacuum LLC
About This Webinar
This webinar, for engineers, scientists, CTOs and others involved in product or materials development, will discuss the architecture and operation of a Plasma Emission Monitoring (PEM) system integrated into a Denton Vacuum (DV) sputtering chamber, with confocal cathode configuration (DV-PEM). The presentation will cover everything you need to know about pulsed DC reactive sputtering with PEM and will provide you with a thorough understanding of how Denton Vacuum provides fully integrated PEM with its thin film deposition system. The presenter, George Papasouliotis, Ph.D., is the Chief Technology Officer of Denton Vacuum and holds more than 50 patents in thin film deposition and plasma processing.

PEM is traditionally used for closed loop feedback control of reactive sputtering processes depositing insulating films, either compounds or alloys, in the transition mode, where deposition rate, film composition and other properties can be optimized. However, the technique can also be used as a health monitor for the deposition chamber, determining its conditioning state and process readiness, and to obtain guidance for process development, scale-up and transfer.

Denton Vacuum Integrated PEM in Discovery Sputtering System.

DV-PEM uses the emission spectra of reactively sputtered plasma species to control the reactive gas partial pressure through a closed loop proportional-integral-derivative (PID) controller. In an exemplary use case, the system is deployed to successfully control, in transition mode, the deposition of TiO2 films used in optical applications. Process performance and stability are assessed by optical transmission, refractive index and physical thickness measurements of the deposited metal oxide films.

George Papasouliotis, CTO of Denton VacuumPresenter George Papasouliotis, Ph.D. is the Chief Technology Officer of Denton Vacuum, where he oversees technology and engineering and leads product and technology development. Before joining Denton, he held senior technical and management roles at Novellus Systems, Varian Semiconductor Equipment Associates and Veeco Instruments. Papasouliotis received his Masters and Ph.D. degrees in Chemical Engineering from the University of Rochester and his Diploma in Chemical Engineering from the Aristotle University of Thessaloniki, Greece. He has published over 30 reference articles and holds over 50 U.S. patents in the areas of thin film deposition and plasma processing for semiconductor, optical and structural applications.

About Denton Vacuum
From basic research to manufacturing handoff, Denton Vacuum provides thin film deposition technology that delivers consistent, repeatable results through wide-process capability, ease-of-use, superior reliability, and global service and support. Denton Vacuum's thin film deposition technologies provide superior performance in such applications as precision optics, lift-off & step coverage, dual-sided laser facet coating, indium for wafer level packaging, diamond-like carbon, metallization, medical and decorative coatings

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Research & TechnologyAmericasOpticsplasmaplasma emission monitoringvacuum chamberthin film depositionplasma processingsputteringvacuum deposition
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