Search
Menu
Spectrogon US - Optical Filters 2024 LB

Gas Purging Keeps UV Spectrophotometers Healthy

Facebook X LinkedIn Email
Author: Dr. Adam Wise and David Riley
Monday, October 16, 2017
McPHERSON

Measuring in the far-UV (FUV) 120-220 nm presents unique challenges. The high energy that makes UV light interesting can cause photochemical formation of organic films on optical surfaces. These films cause increasing, wavelength-dependent loss of performance. To control the growth of organic films, UV measurements can be made in an inert gas atmosphere (typically nitrogen) rather than under vacuum. Nitrogen gas in UV spectrophotometers reduces contaminant desorption and photopolymerization, without decreasing optical performance.

Download White Paper
File: gas_purge_for_UV.pdf (724.67 KB)
To download this white paper, please complete the *required fields before clicking the "Download" button.
Your contact information
* First Name:
* Last Name:
* Email Address:
* Company:
* Country:




When you click "Download", you agree that your personal contact information may be shared with McPHERSON and they may contact you about their products and services in the future. You also agree that Photonics Media may contact you with information related to this request, and that you have read and accept our Privacy Policy and Terms and Conditions of Use.

Register or login to auto-populate this form:
Login Register
* Required
spectroscopyTest & MeasurementOpticsultravioletUVvacuumVUVSpectrometerspectrophotometermonochromatorpurgenitrogenargonmeasurementspectrumMcPherson
We use cookies to improve user experience and analyze our website traffic as stated in our Privacy Policy. By using this website, you agree to the use of cookies unless you have disabled them.