Analysis of Metallic Impurities in Si Wafers Using Fully Automated VPD-ICP-MS

Facebook X LinkedIn Email
Tuesday, June 8, 2021

This work demonstrates the coupling of an IAS Expert_PS VPD (vapor phase decomposition) system with the Perkinelmer NexION® 5000 ICP-MS, delivering a fully automated, reliable solution for the determination of metallic impurities introduced during Si wafer production, thanks to the ICP-MS' sensitivity and ability to remove spectral inferences when performing trace analysis in combination with a platform that eliminates manual operation and chemical exposure to operators to prevent Si wafer contamination.

Download White Paper
File: Metallic_Impurities_in_Silicon_Wafers.pdf (1.35 MB)
To download this white paper, please complete the *required fields before clicking the "Download" button.
Your contact information
* First Name:
* Last Name:
* Email Address:
* Company:
* Country:

When you click "Download", you agree that your personal contact information may be shared with PerkinElmer and they may contact you about their products and services in the future. You also agree that Photonics Media may contact you with information related to this request, and that you have read and accept our Privacy Policy and Terms and Conditions of Use.

Register or login to auto-populate this form:
Login Register
* Required
Sensors & DetectorsElectronics & Signal AnalysisMaterialsMaterials & Chemicalscomputer engineeringsemiconductors
We use cookies to improve user experience and analyze our website traffic as stated in our Privacy Policy. By using this website, you agree to the use of cookies unless you have disabled them.