Search Menu
Photonics Media Photonics Buyers' Guide Photonics EDU Photonics Spectra BioPhotonics EuroPhotonics Industrial Photonics Photonics Showcase Photonics ProdSpec Photonics Handbook
More News
Email Facebook Twitter Google+ LinkedIn Comments

Jmar to Create Advanced X-Ray Stepper

Photonics Spectra
Feb 2002
As part of a program to advance x-ray lithography technology, Jmar/Sal NanoLithography Inc., a division of Jmar Technologies Inc., has received a $1.7 million order from the University of Wisconsin to upgrade its JSal Model 4 x-ray lithography Stepper, installed at the university's Aladdin Synchrotron at the Center for NanoTechnology in Stoughton.

The instrument would produce high-precision, multilayer sub-50-nm semiconductor microcircuits. It would expose and process wafers with highly reproducible linewidths of 70 to 50 nm or smaller, and would have wafer processing throughput rates in excess of 30 wafer levels per hour.

Other participants in this project include Mitsubishi Electric Corp., which will supply advanced x-ray masks, and Massachusetts Institute of Technology, the University of Vermont and Louisiana State University.

Businessindustriallight speed

Terms & Conditions Privacy Policy About Us Contact Us
back to top

Facebook Twitter Instagram LinkedIn YouTube RSS
©2018 Photonics Media
x Subscribe to Photonics Spectra magazine - FREE!