Search Menu
Photonics Media Photonics Buyers' Guide Photonics EDU Photonics Spectra BioPhotonics EuroPhotonics Industrial Photonics Photonics Showcase Photonics ProdSpec Photonics Handbook
More News
Email Facebook Twitter Google+ LinkedIn Comments

Interference Photolithography Produces Photonic Crystals

Photonics Spectra
Feb 2002
A team from Pennsylvania State University in University Park has developed an interference-photolithography method to produce 2-D photonic crystal structures. The scientists fabricated the 0.8- to 2.0-µm-period titania arrays by exposing a titanium-containing monomer film to 355-nm, 15-ns pulses from an Nd:YAG laser from Spectra-Physics in Mountain View, Calif., filtered through a three-grating interference mask. They then rinsed the arrays with methanol and calcinated them at 575 °C.

The researchers say this simple and relatively inexpensive technique can produce various array structures by employing different grating mask patterns, potentially making it a boon to integrated photonic circuit applications. Specifically, it may especially benefit fabrication of photonic crystal waveguides and microcavity lasers. The results of the work were reported in the Nov. 12 issue of Applied Physics Letters.

industrialResearch & TechnologyTech Pulse

Terms & Conditions Privacy Policy About Us Contact Us
back to top
Facebook Twitter Instagram LinkedIn YouTube RSS
©2018 Photonics Media, 100 West St., Pittsfield, MA, 01201 USA,

Photonics Media, Laurin Publishing
x Subscribe to Photonics Spectra magazine - FREE!
We use cookies to improve user experience and analyze our website traffic as stated in our Privacy Policy. By using this website, you agree to the use of cookies unless you have disabled them.