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Deposition Sciences Inc. - Difficult Coatings - LB - 8/23

Wafer Processing Yields High Q Microcavities

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Microcavities require atomically smooth surfaces to obtain ultrahigh Q factors, but until recently such surfaces have been demonstrated only in structures such as droplets or microspheres. Researchers at California Institute of Technology in Pasadena have found a way to obtain ultrahigh Q using wafer-scale processing.

As described in the Feb. 27 issue of Nature, they first created support pillars using photolithography, pattern transfer into the silicon dioxide and selective dry etching of the exposed silicon. They then heated the silicon dioxide to reflow it and forced the molten disc into a toroid-shaped microcavity with an atomically smooth surface and a Q of greater than 100 million.
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Published: April 2003
Glossary
photolithography
Photolithography is a key process in the manufacturing of semiconductor devices, integrated circuits, and microelectromechanical systems (MEMS). It is a photomechanical process used to transfer geometric patterns from a photomask or reticle to a photosensitive chemical photoresist on a substrate, typically a silicon wafer. The basic steps of photolithography include: Cleaning the substrate: The substrate, often a silicon wafer, is cleaned to remove any contaminants from its surface. ...
Basic SciencedropletsindustrialmicrocavitiesmicrospheresphotolithographyResearch & TechnologyTech Pulseultrahigh Q factors

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