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Veeco, Schott Ally to Upgrade Photomask Technology

Photonics Spectra
Aug 2003
To advance photomask technology and particle reduction for next-generation photomask blanks, Schott Lithotec AG of Jena, Germany, and Veeco Instruments Inc., whose Process Equipment Div. is in Rochester, N.Y., have signed a joint development agreement. Improved blank production is important for enabling the semiconductor industry to produce integrated circuits with reduced feature sizes and enhanced performance. Schott Lithotec will provide materials and process technology capabilities for advanced blanks, and Veeco will contribute expertise in low-defect ion-beam deposition.

advance photomask technologyBusinesslight speednext-generation photomask blanksparticle reductionSchott Lithotec AG

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