Search Menu
Photonics Media Photonics Buyers' Guide Photonics EDU Photonics Spectra BioPhotonics EuroPhotonics Industrial Photonics Photonics Showcase Photonics ProdSpec Photonics Handbook
More News
Email Facebook Twitter Google+ LinkedIn Comments

High-Numerical-Aperture Microlenses Fabricated by Soft Lithography

Photonics Spectra
Apr 2005
In the March 14 issue of Applied Physics Letters, researchers at Nanyang Technological University in Singapore and Shenzhen University in China describe the use of soft lithography to produce microlenses in hybrid SiO2/TiO2 sol-gel glass, with numerical apertures of 0.3 to 0.5. The technique may have applications in the fabrication of optical elements for telecommunications, optical memory and imaging.

The researchers created a master by heating a patterned photoresist so that it flowed to form an array of hemispheres that could be used as planoconvex lenses. They coated this with polydimethylsiloxane, which, when cured, formed an elastomeric negative mold. To reproduce the master array, they pressed the mold onto a photosensitive sol-gel layer, which they cured under UV radiation to form hybrid SiO2/TiO2 sol-gel glass.

As We Go To PressBreaking NewsCommunicationsindustrialmicrolensesNanyang Technological UniversityPresstime BulletinShenzhen Universitysoft lithography

Terms & Conditions Privacy Policy About Us Contact Us
back to top
Facebook Twitter Instagram LinkedIn YouTube RSS
©2018 Photonics Media, 100 West St., Pittsfield, MA, 01201 USA,

Photonics Media, Laurin Publishing
x Subscribe to Photonics Spectra magazine - FREE!
We use cookies to improve user experience and analyze our website traffic as stated in our Privacy Policy. By using this website, you agree to the use of cookies unless you have disabled them.