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Intel Supports EUV Source Development

Photonics Spectra
Apr 2006
Intel Corp.’s investment business, Intel Capital, has provided funding to Xtreme technologies GmbH to advance its development of extreme-ultraviolet sources for photolithography at its plants in Jena and Göttingen, Germany. Xtreme is a joint venture of Jenoptik AG in Jena and of Ushio Inc. in Tokyo.

A lithographic technique using an image produced by photography for printing on a print-nonprint, sectioned surface.
Businessextreme-ultraviolet sourcesindustrialIntel Corp.light speedphotolithography

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