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Photronics, Micron Technology Open Mask Center
May 2006
BROOKFIELD, Conn., May 8, 2006 -- Photomask maker Photronics Inc. of Brookfield, Conn., and Micron Technology Inc. of Boise, Idaho, announced today a joint venture to develop photomasks for semiconductors, the MP Mask Technology Center LLC. The companies said the center will support joint development work already underway and will begin supplying photomasks immediately.

Micron manufactures DRAMs, NAND Flash memory, CMOS image sensors, other semiconductor components, and memory modules for use in computing, consumer, networking and mobile products.

Photronics owns 49.99 percent of the venture, and Micron owns 50.01 percent. The companies said they will build an independent nanotechnology fabrication facility at Micron's existing photomask technology center in Boise that will be operated by Photronics. Photronics said it expects to invest $100 million to $150 million, in new capital and redeployed assets, in the facility, which is expected to be completed by the end of 2007. Micron and Photronics have also entered into a technology license agreement and certain supply agreements connected with the venture.

A board of managers comprised of Photronics and Micron representatives will oversee the operations of MP Mask. Randal W. Chance will be general manager, and Mark Durcan, COO of Micron Technology, is chairman of the board of managers.

For more information, visit:

CMOSCommunicationsDRAMsMicronMicron TechnologyMP Mask Technology CenterNews & FeaturesphotomaskphotomasksPhotronicssemiconductorsSensors & Detectors

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