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Companies Sign Pact on Nanoimprinting

Jul 2008
EINDHOVEN, the Netherlands -- Philips Research and Suss MicroTec Inc. of Waterbury Center, Vt., USA, have entered into a licencing agreement on a new technology called substrate conformal imprint lithography. The companies intend to bring to market an existing equipment platform to which has been added this novel nanoimprinting feature, enabling new approaches to large-area imprint applications.

Euro NewsEuropeindustrialnanoimprintingNewssubstrate conformal imprint lithography

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