SAN DIEGO, Calif., May 12 -- Cymer, Inc., a supplier of illumination sources for deep ultraviolet photolithography, and Carl Zeiss Lithos, a subsidiary of Carl Zeiss, have formed a strategic alliance to develop and design leading-edge optical components and modules for lithography light sources in accordance with the Semiconductor Industry Association guidelines.
``We are extremely pleased to have formed this alliance with Zeiss,'' said David Skinner, vice president of global supply management for Cymer. ``Both companies will gain a better understanding of the interaction between the light source and the optics within the lithography tool. This knowledge will be crucial as Cymer continues to develop next-generation light sources to support the global lithography marketplace. Zeiss' unique capabilities and expertise in optics and coatings, along with Schott ML's optics materials development, complement Cymer's proficiency in providing next-generation light sources for lithography.''