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104 W EUV Light Source Output Achieved
May 2010
OYAMA, Japan, May 4, 2010 — Gigaphoton Inc., a lithography light source manufacturer, announced that an extreme ultraviolet (EUV) light source developed by the technology consortium Extreme Ultraviolet Lithography System Development Association has achieved 104 W — the world’s highest output.

The milestone signals a step forward in the industry for the realization of the first volume-production-worthy EUV light source shipment targeted for 2011. Made under the Laser Produced Plasma (LPP) Light Source Development Program for EUV Lithography, it is promoted by EUVA.

As a member of the EUVA, the company has been working on the development of LLP light sources for EUV lithography since 2002.

One of the biggest challenges facing EUV lithography tools is the ability to achieve a higher output power, which is critical for volume production applications.

The company’s achievement in the area is a result of years work in EUV light source technology, which includes breakthroughs in the use of tin targets and carbon dioxide lasers for improved conversion efficiency, as well as the use of magnetic fields for debris removal.

For more information, visit: 

Asia-PacificBusinesscarbon dioxidedebris removalEUVEUV light sourceEUVAextreme ultravioletExtreme Ultraviolet Lithography System Development AssociationGigaphotonindustriallaser produced plasmaLight Source Development Program for EUV Lithographylight sourceslithographyLPPmagnetic fieldoutputtinultravioletvolume production

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