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Nova Offers Systems Upgrades
May 2010
REHOVOT, Israel, May 11, 2010 — Nova Measuring Instruments Ltd., a provider of standalone and integrated metrology solutions for the semiconductor process control market, announced the availability of productivity enhancement packages. The packages elevate metrology performance and increase the sampling rate of wafers being processed to enable tighter process control, said the company.

The basic productivity package provides the following benefits: 

    • Up to 40 percent reduction in cycle time, enabling 100 percent sampling to increase process CPk 
    • Up to 30 percent improvement in precision and long-term stability 
    • Three times longer lamp lifetime, reducing tool maintenance costs

The second package offers optical CD productivity, which expands the measurement capabilities of a thin-film integrated metrology tool to optical CD applications, addressing the increase in application complexity and pattern densities experienced by customers as they migrate existing capacity to next-generation technology nodes.

“As semiconductor manufacturers ramp up following the downturn, they deploy existing equipment to its maximal capacity,” said Ziv Barzilay, director of global services. “By expanding the performance envelope of integrated metrology, our customers achieve higher utilization and better yield at advanced technology nodes.”

For more information, visit: 

The science of measurement, particularly of lengths and angles.
light sourcesmetrologyMiddle EastopticsTest & MeasurementWafers

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