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Partnership Eyes Deep-UV Photolithography

Photonics Spectra
Jul 1999
Cymer Inc. and Carl Zeiss Lithos have teamed up to facilitate the development of optical components and modules for lithography light sources. San Diego-based Cymer supplies illumination sources for deep-UV photolithography, and Carl Zeiss Lithos of Germany manufactures optics.

Engineers from both companies will investigate how optics and light sources interact. They also will try to achieve finer resolutions and smaller linewidths to enable further advances in semiconductors in compliance with the Semiconductor Industry Association road map. Zeiss will contribute optics and coatings, while Cymer will continues its development of excimer laser illumination sources.

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