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Photronics Mourns Board Member

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Photronics Inc., a photomask manufacturer, announced that a member of its board of directors died on Dec. 13, 2010.

Willem D. Maris, 71, served as a director of the company since 2000 and was a member of its board’s nominating committee.

Before joining the company, he served as the president and CEO of ASML Lithography Holding N.V. from June 1990 until his retirement in January 2000. While serving on the Photronics’ board, he also acted as director of FSI International Inc.

“Willem’s warm presence and contributions at our board meetings will be deeply missed,” Constantine Macricostas said. “His comprehensive knowledge of technology and the semiconductor industry was a valuable asset to the company.”

The company plans to initiate a search to replace Maris.

For more information, visit: www.photronics.com 
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Published: December 2010
Glossary
director
In a liquid crystal system, the director refers to the local symmetry axis around which the long range order of the liquid crystal is aligned. In the case of the nematic phase, the molecular long axis is, on the average, parallel to the director.
nano
An SI prefix meaning one billionth (10-9). Nano can also be used to indicate the study of atoms, molecules and other structures and particles on the nanometer scale. Nano-optics (also referred to as nanophotonics), for example, is the study of how light and light-matter interactions behave on the nanometer scale. See nanophotonics.
photomask
A photomask, also known simply as a mask or reticle, is a key component in the photolithography process used in semiconductor manufacturing and other areas of microfabrication. It is a high-precision plate or glass substrate that carries a pattern of opaque and transparent regions. Photomasks are crucial for transferring intricate patterns onto semiconductor wafers during the photolithography process. The photomask is typically placed in the optical path between a light source and a...
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