Ophir-Spiricon Opens New Cleanroom

Ophir-Spiricon, a member of the precision laser measurement equipment provider Ophir Photonics Group, has opened a cleanroom at its new facility in Logan.

The 840-sq-ft cleanroom is used for manufacturing the solid-state, pyroelectric detector arrays used in the company’s PyroCam beam profiling cameras. The cameras are used to create clear and illuminating images of laser beam profiles.

Housing photolithography and thin-film deposition processes, the cleanroom features yellow lighting to prevent premature exposure of the photolithography materials used. In addition, it complies with ISO 7 standards for airflow and filtration. Humidity and temperature are tightly controlled. An airlock and protective clothing also are used to decrease contamination.

“The new cleanroom provides a cleaner production environment,” said Gary Wagner, president of Ophir-Spiricon. “This translates into less defects and better yield for both the lithography and thin-film deposition processes. In addition, we can produce larger, more dense arrays with higher pixel fill factors for higher resolution cameras.”

For more information, visit: www.ophiropt.com

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Published: June 2011

Glossary

cleanroom: An area in which airborne particulates can be monitored and controlled so that given size particles do not exceed a specified concentration, thereby eliminating potential dysfunctions in gyroscopes, ball bearings and other materials and lubricants.
lithography: Lithography is a key process used in microfabrication and semiconductor manufacturing to create intricate patterns on the surface of substrates, typically silicon wafers. It involves the transfer of a desired pattern onto a photosensitive material called a resist, which is coated onto the substrate. The resist is then selectively exposed to light or other radiation using a mask or reticle that contains the pattern of interest. The lithography process can be broadly categorized into several...
photolithography: Photolithography is a key process in the manufacturing of semiconductor devices, integrated circuits, and microelectromechanical systems (MEMS). It is a photomechanical process used to transfer geometric patterns from a photomask or reticle to a photosensitive chemical photoresist on a substrate, typically a silicon wafer. The basic steps of photolithography include: Cleaning the substrate: The substrate, often a silicon wafer, is cleaned to remove any contaminants from its surface. ...

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