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Adlyte Expands Operations
Nov 2012
ZUG, Switzerland, Nov. 16, 2012 — Extreme ultraviolet (EUV) light source developer Adlyte Inc. has expanded its semiconductor operations with a new facility that nearly triples the amount of development space available.

The company makes EUV light sources for photomask and wafer inspection applications, and is now building a new light source for the inspection of actinic masks, aerial image metrology systems and sub-1x-nm devices.

Adlyte also announced the appointment of industry veteran Joseph R. Bronson to its strategic advisory board.

Bronson previously spent 21 years with Applied Materials in various management positions, including chief financial officer and executive vice president. He has also held executive management positions at FormFactor and Sanmina-SCI. He is currently on the board of directors at Maxim Integrated Products and Jacobs Engineering Group.

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The science of measurement, particularly of lengths and angles.
The technology of generating and harnessing light and other forms of radiant energy whose quantum unit is the photon. The science includes light emission, transmission, deflection, amplification and detection by optical components and instruments, lasers and other light sources, fiber optics, electro-optical instrumentation, related hardware and electronics, and sophisticated systems. The range of applications of photonics extends from energy generation to detection to communications and...
actinic mask inspectionAdlyte Inc.aerial image metrology systems inspectionAIMSApplied MaterialsBusinesscompany expansionEuropeEUVEUV light sourceextreme ultraviolet light sourceFormFactorinspectionJacobs Engineering GroupJoseph R. BronsonmanufacturingMaxim Integrated Productsmetrologynanonew facilityopticsphotomaskphotonicsSanmina-SCIsemiconductorsSwitzerlandWafers

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