Search
Menu
PI Physik Instrumente - Revolution In Photonics Align LW LB 3/24

eBeam Expands Focus, Education Efforts

Facebook X LinkedIn Email
SAN JOSE, Calif., March 10, 2016 — The eBeam Initiative, a forum dedicated to the education and promotion of new semiconductor manufacturing approaches based on electron beam (eBeam) technologies, will be expanding its efforts to increase focus on eBeam requirements and new developments.

The plans for extreme UV lithography, nanoimprint lithography (NIL) and multibeam mask writing were addressed by industry luminary guest speakers at the annual eBeam Initiative luncheon held during the SPIE Advanced Lithography Conference.

Canon Nanotechnologies Inc. has also joined the initiative, providing perspective on semiconductor technology and NIL.

"eBeam technology is essential, no matter which lithography approach is used, for semiconductor manufacturing,” said Aki Fujimura, CEO of D2S, managing company sponsor of the eBeam Initiative. “Canon's pioneering work in NIL is important to the development of advanced semiconductor technology. We look forward to Canon's support of our ongoing collaborative efforts to educate the photomask and semiconductor industries on the importance of eBeam technology."

Last year’s eBeam Initiative's annual survey revealed that the majority of respondents believe that multi-beam mask writing machines will be used in high-volume manufacturing for critical-layer masks by the end of 2018. To support the infrastructure for multi-beam mask writing, as well as alternative next-generation lithography approaches like EUV and NIL, the eBeam Initiative will increase its education focus in these areas.

"Canon is building on more than a decade of investment in developing NIL into a viable semiconductor lithography solution for sub-20-nm high-resolution processes," stated Doug Resnick, vice president of marketing and business development at Canon Nanotechnologies. "The ability to write 1X patterns on NIL templates with extremely high precision is critical to realizing NIL's potential as a production-worthy technology.”
Gentec Electro-Optics Inc   - Measure Your Laser MR

Published: March 2016
Glossary
lithography
Lithography is a key process used in microfabrication and semiconductor manufacturing to create intricate patterns on the surface of substrates, typically silicon wafers. It involves the transfer of a desired pattern onto a photosensitive material called a resist, which is coated onto the substrate. The resist is then selectively exposed to light or other radiation using a mask or reticle that contains the pattern of interest. The lithography process can be broadly categorized into several...
nano
An SI prefix meaning one billionth (10-9). Nano can also be used to indicate the study of atoms, molecules and other structures and particles on the nanometer scale. Nano-optics (also referred to as nanophotonics), for example, is the study of how light and light-matter interactions behave on the nanometer scale. See nanophotonics.
BusinesspartnershipsCanonAmericasEbeamsemiconductorslithographynanoLasersindustrialmaterials processingaki fujimuraD2Sdoug Resnickeducation

We use cookies to improve user experience and analyze our website traffic as stated in our Privacy Policy. By using this website, you agree to the use of cookies unless you have disabled them.