SAN DIEGO, Oct. 1 -- JMAR Technologies Inc., a developer of collimated laser plasma lithography systems, announced it received $7.7 million in funding to demonstrate its integrated NanoPulsar semiconductor lithography stepper system and its evaluation by GaAs end users. This program is sponsored by the Defense Advanced Research Projects Agency (DARPA). The new funding is part of an incremental $34.5 million award JMAR received from the U.S. Army in February. Under the new contract, JMAR will increase the processing throughput of its CPL system by increasing the laser source power output,...Read full articleRelated content from Photonics MediaArticlesSCHNEIDER Partners with Micro-LAM; Laser Light Companies Receive $100M in Debt Financing: Week in Brief: 11/17/23US Capital Global has entered into a term sheet to provide credit facilities totaling a minimum of $100 million to Laser Light Companies, a global networking platform designer and builder. 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