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Cymer Expands into Extreme UV

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Aaron J. Hand

As the semiconductor industry debates next-generation lithography, the players are scrambling to develop components for the narrowing field of choices. Cymer Inc. recently announced that it has entered the game, working on a 13.5-nm light source for extreme-UV lithography. The company has developed a prototype EUV light source based on a dense plasma focus device. Although Cymer has departed from the laser source used in its offerings for deep-UV lithography, there are several similarities between the two light sources. The latest prototype, for example, uses an all-solid-state pulse...Read full article

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    Published: May 1999
    industrialResearch & TechnologyTech Pulse

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