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Carl Zeiss, Synopsys Collaborate on Photomask Manufacturing

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JENA, Germany and MOUNTAIN VIEW, Calif., Nov. 5, 2010 — Carl Zeiss SMS GmbH and Synopsys Inc. announced a collaboration to support the Zeiss tool family for in-die metrology solutions for the 32-nm technology node and below. Under the deal, Synopsys will offer support for Zeiss’ PROVE, the next-generation registration metrology tool, through its CATS, a mask data preparation solution. Using CATS as the data preparation engine, mask engineers using PROVE can benefit from improved efficiency and usability of a registration metrology system that meets stringent overlay accuracy requirements, the companies said. Featuring 193-nm...Read full article

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    Published: November 2010
    Glossary
    lithography
    Lithography is a key process used in microfabrication and semiconductor manufacturing to create intricate patterns on the surface of substrates, typically silicon wafers. It involves the transfer of a desired pattern onto a photosensitive material called a resist, which is coated onto the substrate. The resist is then selectively exposed to light or other radiation using a mask or reticle that contains the pattern of interest. The lithography process can be broadly categorized into several...
    mask
    1. A framelike structure that serves to restrict the viewing area of the screen when placed before a television picture tube. 2. In photolithography, a photomask (or mask) is typically a patterned transparent plate or an opaque plate with patterned holes or transparencies that uses a laser light source to transfer and print the pattern by an etching process onto a substrate that is typically a silicon wafer used in integrated circuitry.
    metrology
    Metrology is the science and practice of measurement. It encompasses the theoretical and practical aspects of measurement, including the development of measurement standards, techniques, and instruments, as well as the application of measurement principles in various fields. The primary objectives of metrology are to ensure accuracy, reliability, and consistency in measurements and to establish traceability to recognized standards. Metrology plays a crucial role in science, industry,...
    photomask
    A photomask, also known simply as a mask or reticle, is a key component in the photolithography process used in semiconductor manufacturing and other areas of microfabrication. It is a high-precision plate or glass substrate that carries a pattern of opaque and transparent regions. Photomasks are crucial for transferring intricate patterns onto semiconductor wafers during the photolithography process. The photomask is typically placed in the optical path between a light source and a...
    2-D design clipsAmericasBusinessCarl ZeissCarl Zeiss SMSCATSdata preparation solutionDirk Beyerelectronic design automationEuropeFabio Angelillisillumination opticsimage analysis schemesImagingin-die metrologyindustrialinspectionlithographymaskmask engineersmask registration errorsmetrologyOpticsphotomaskphotomask metrologyPROVEregistration marksrepair toolsSemiconductor Metrology SystemssemiconductorsSilicon Engineering GroupSoftwareSynopsystechnology nodeZeiss

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