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Apollo Precision Orders Crius

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AACHEN, Germany, Dec. 20, 2010 — Aixtron AG announced that Apollo Precision Ltd., a new customer from Quanzhou, Fujian Province, China, has recently ordered an MOCVD reactor. Comprising one Crius 31 x 2-in. configuration deposition system, the order was placed in the third quarter of 2010, with delivery to take place this month. The system will be utilized for production of LED backlight units. Production of the reactor took place at Aixtron’s production plant in China. “We are making a new investment to enter the LED epitaxy business, and the Crius reactor will form the basis of our growth...Read full article

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    Published: December 2010
    Glossary
    epitaxy
    A well controlled thin films technique for growing films with good crystal structure in ultra high vacuum environments at very low deposition rates. Epitaxy methods are well known for the growing of single crystals in which chemical reactions produce thin layers of materials whose lattice structures are identical to that of the substrate on which they are deposited. Some examples are molecular beam epitaxy, liquid phase epitaxy and vapor phase epitaxy. Molecular beam epitaxy is also commonly...
    reactor
    In chemistry, a device in which a chemical reaction takes place. In electronics, a device that introduces reactance into a circuit.
    thin film
    A thin layer of a substance deposited on an insulating base in a vacuum by a microelectronic process. Thin films are most commonly used for antireflection, achromatic beamsplitters, color filters, narrow passband filters, semitransparent mirrors, heat control filters, high reflectivity mirrors, polarizers and reflection filters.
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