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Plasma Source Enables High-Volume Manufacturing with EUV Lithography

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Phil Alibrandi, Gigaphoton USA Inc.

As the lithography capital equipment sector moves toward early field deployment of extreme-ultraviolet (EUV) scanners and support, the 13.5-nm EUV energy source continues to be a key factor in the ultimate adoption and economic success of the technology. Given the high price of capital equipment investment, traditional high-volume manufacturing (HVM) measures continue to be relevant and are hurdles to wide-scale acceptance by chip makers. In 2002, Gigaphoton began drawing upon the resources of Komatsu Ltd. of Hiratsuka, Japan, and its ongoing work with the Extreme Ultraviolet Lithography...Read full article

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    Companies
    Published: September 2011
    Glossary
    conversion efficiency
    In a pumped laser system, the ratio of output energy to pump energy.
    lithography
    Lithography is a key process used in microfabrication and semiconductor manufacturing to create intricate patterns on the surface of substrates, typically silicon wafers. It involves the transfer of a desired pattern onto a photosensitive material called a resist, which is coated onto the substrate. The resist is then selectively exposed to light or other radiation using a mask or reticle that contains the pattern of interest. The lithography process can be broadly categorized into several...
    plasma
    A gas made up of electrons and ions.
    CO2 laser-tin-LPP schemeconversion efficiencydebris mitigationdroplet generationEUVEUV lithographyExtreme Ultraviolet Lithography System Development AssociationFeaturesGigaphoton USA Inc.High-Volume ManufacturingHVMindustrialKomatsu Ltd.laser-produced plasmalithographyLPPmirrorsPhil Alibrandiplasmasemiconductorsthermal expansiontin ionizationLasers

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