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New EUV Microscope to Lead to Next-Gen Semiconductors

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BERKELEY, Calif., Nov. 2, 2011 — Delving into the extreme ultraviolet wavelengths further than ever, a novel microscope is set to provide leaps forward in photolithography technology. The device, dubbed SHARP (for “Semiconductor High-NA Actinic Reticle Review Project”), will have higher resolution, speed, illumination uniformity and coherence control than existing instruments, and is designed to push research toward semiconductors with features as small as 6 nm. The $4.1 million, 1½-year-long project to build the instrument is a collaboration between scientists at Lawrence Berkeley National...Read full article

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    Published: November 2011
    Glossary
    extreme ultraviolet
    Extreme ultraviolet (EUV) refers to a specific range of electromagnetic radiation in the ultraviolet part of the spectrum. EUV radiation has wavelengths between 10 and 124 nanometers, which corresponds to frequencies in the range of approximately 2.5 petahertz to 30 exahertz. This range is shorter in wavelength and higher in frequency compared to the far-ultraviolet and vacuum ultraviolet regions. Key points about EUV include: Source: EUV radiation is produced by extremely hot and energized...
    photolithography
    Photolithography is a key process in the manufacturing of semiconductor devices, integrated circuits, and microelectromechanical systems (MEMS). It is a photomechanical process used to transfer geometric patterns from a photomask or reticle to a photosensitive chemical photoresist on a substrate, typically a silicon wafer. The basic steps of photolithography include: Cleaning the substrate: The substrate, often a silicon wafer, is cleaned to remove any contaminants from its surface. ...
    sharp
    A term used to describe a convex surface having too short a radius of curvature. To correct this condition, material is cut from the outer portion of the polishing tool.
    Actinic Inspection ToolAdvanced Light SourceAITAmericasBasic ScienceCaliforniacamerasCenter for X-Ray OpticsCoatingsCXROextreme ultravioletImagingindustrialKenneth GoldbergLawrence Berkeley National LaboratorylensesmicroscopesMicroscopymirrorsOpticsphotolithographyphotomasksResearch & TechnologySemiconductor High-NA Actinic Reticle Review ProjectSharp

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